Atomic layer deposition of HfO2 – nucleation, growth and structure development of thin films (Eesti üliõpilaste teadustööde riiklik konkurss ; 2011)
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Atomic layer deposition of HfO2 – nucleation, growth and structure development of thin films (Eesti üliõpilaste teadustööde riiklik konkurss ; 2011)

Technical data

Publisher:
Tartu University Press
Published:
Language:
English
Depositor:
Archimedes SA
User Note:
http://hdl.handle.net/10062/18095
Type:
book
Copyrighted
ESTER
b27013558
ISBN
978-9949-19-780-4

URL: http://www.digar.ee/id/nlib-digar:110327

Keywords

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